主要论文 |
[1] X. He, Y. Li, G. Tang, Q. Sun, X. Tang, D. Zhang* and W. Zheng, IEEE Trans. Electron Devices, 2026, 73, 858-864. [2] P. Xuan, D. Zhang*, C. Zhang, J. Liang, H. Yang, X. Tang and W. Zheng, Opt. Laser Technol., 2026, 198, 114937. [3] W. Li, X. He, R. Dai, D. Zhang*, W. Zheng* and F. Huang, J. Alloys Compd., 2025, 1036, 181983. [4] H. Yang, H. Yang, D. Zhang*, J. Xie, Q. Sun, G. Tang, T. Li*, X. Tang and W. Zheng, Mater. Today Phys., 2025, 59, 101886. [5] H. Cai, H. Yang, W. Li, J. Liang, Z. Lin, X. Tang, Y. Liu, D. Zhang* and W. Zheng, Chem. Eng. J., 2025, 506, 159844. [6] D. Zhang*, W. Li, J. Liang, Z. Lin, X. Tang and W. Zheng*, Appl. Mater. Today, 2025, 42, 102622. [7] D. Zhang*, J. Liang, H. Cai, W. Li, Z. Wang, Q. Sun, X. Tang and W. Zheng*, IEEE Trans. Electron Devices, 2025, 72, 289-294. [8] J. Liang, W. Li, J. Xie, H. Cai, X. Tang, D. Zhang* and W. Zheng, IEEE Trans. Electron Devices, 2024, 71, 5450-5455. [9] J. Liang, H. Cai, W. Li, Z. Lin, X. Tang, D. Zhang* and W. Zheng, J. Mater. Chem. C, 2024, 12, 5964-5971. [10] D. Zhang, J. Liang, Z. Luo, Z. Wang, Y. Liu and W. Zheng*, IEEE Electron Device Lett., 2024, 45, 168-171. [11] D. Zhang, J. Liang, H. Cai, Z. Lin, G. Tang, X. Tang, Q. Sun* and W. Zheng*, IEEE Trans. Electron Devices, 2024, 71, 2491-2496. [12] J. Liang, F. Li, G. Tang, Y. Liu, D. Zhang* and W. Zheng*, IEEE Electron Device Lett., 2023, 44, 1947-1950. |